Field Emission Transmission Electron Microscope HF5000

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HITACHI

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Mô tả sản phẩm

Features

Hitachi fully automated probe-forming spherical aberration corrector
High-brightness and high-stability cold FE electron gun (Cold FEG)
Ultra-stable column and power supplies for enhanced instrument performance
Simultaneous Cs-corrected SEM & STEM imaging capability with atomic resolution
New high-stability side-entry specimen stage and specimen holders
Symmetrically opposed dual 100 mm² EDX^* detectors : "Symmetrical Dual SDD^*"
Newly designed enclosure for optimum performance in real laboratory environments
A wide range of Hitachi advanced specimen holders^*

*Option

High-brightness Cold FEG×High-stability×Hitachi automated aberration corrector

The new high-stability Cold FEG uses a thoroughly redesigned version of Hitachi's long-established cold field-emission electron source technology.
Total system stability has also been optimized in order to achieve sub-Å imaging. The column, power supplies and specimen stage have all been newly designed to offer the very best mechanical and electrical stability. Combining these capabilities with Hitachi's unique fully-automated probe-forming Cs-corrector, just requiring a single click of a mouse, ensures all users can reach the very best performance quickly and easily.

Si(211) single crystal HAADF-STEM image (left), image intensity profile (right lower) and FFT power spectrum (right upper)

Symmetrically opposed dual 100 mm² EDX^* detectors : "Symmetrical Dual SDD^*"

High-sensitivity, high-throughput EDX is achieved with symmetrically opposed dual 100 mm² SDDs.
The symmetrical dual SDD configuration results in an almost constant count rate when tilting. On crystalline samples, EDX acquisition can be performed simply with the zone axis aligned, compared with single detector configuration.
The large solid angle also means that EDX mapping can be achieved even on beam-sensitive and/or low X-ray yield specimens, including atomic column mapping. High pixel resolution EDX with wide field of view is also achievable, providing large high-resolution datasets.

GaAs (110) atomic column EDX elemental mapping

Simultaneous Cs-corrected SEM & STEM imaging

Simultaneous SEM & STEM imaging is offered as standard, with ET-type SE detector.
This enables the correlation of surface and internal information with insights into the 3D structure of the specimen, without the need to perform 3D tomography.
Additionally, the Cs-corrected SEM image offers higher spatial resolution with more faithful surface information

Au/CeO<sub>2 </sub>catalyst SEM/ADF-/BF-STEM images (upper), and respective high resolution Au particle images (lower). — Au/CeO₂catalyst SEM/ADF-/BF-STEM images (upper), and respective high resolution Au particle images (lower).

Specifications

Item		Description
Electron source		W(310) cold field emission electron source
Accelerating voltage		200 kV, 60 kV^*1
Imaging resolution	STEM	0.078 nm(ADF-STEM image)
Imaging resolution	TEM	0.102 nm(lattice image)
Magnification	STEM	×20～×8,000,000
Magnification	TEM	×100～×1,500,000
Specimen stage	Specimen stage	Eucentric goniometer 5-axis stage
	Specimen size	3 mm Φ
	Specimen traverse	X, Y=±1.0 mm, Z=±0.4 mm
	Specimen tilt	α=±25°, β=±35°(Hitachi double-tilt specimen holder^*1)
Aberration corrector		Hitachi in-house probe-forming spherical aberration corrector (standard equipment)
Image display	Monitor	27-inch wide LCD panel (for standard monitor and 2nd monitor^*1)
Image display	Camera	Standard retractable camera Screen camera^*1 (for viewing fluorescent screen)

Dimensions & Weight

Item	Width×Depth×Height(mm)	Weight(kg)
Column (incl. electron gun)	1,060×1,742×2,970	2,300
Main unit cover	1,678×1,970×3,157	410
Console unit	1,400×819×740	160
Console extension^*1	580×819×740	53
FE tank	1,041×840×1,317	520
V0 tank	398×630×1,046	180
Control power supply	1,400×693×816	190
Corrector power supply	606×529×1,096	90
Evacuation power supply	913×663×1,790	470
Deflection power supply	913×663×1,790	430
Weight	280×130×130	25
Gatan controller^1^2	576×648×1,173	150
Cooling water control unit	470×540×350	30
Cooling water recirculator^1^2	518×724×1,371	95
Dry pump^*1	252×400×336	23
Air compressor^*1	275×560×576	25

Installation site conditions

Item		Description
Room temperature		15～23℃ (temp. fluctuation : 0.2℃/ h or less)
Humidity		40～60% RH
Power	Main unit	Single phase AC200～240 V ±10%, 50/60 Hz, 10 kVA Circuit breaker rating 50 A
Power	Water recir-culator^1^2	Three phase AC200 V ±5%, 50/60 Hz, 30 A
Grounding terminal		D-class grounding (ground resistance:100 Ω or less)
Cooling water	Flow rate	5.1～5.3 L/min 1 system、2.0～2.2 L/min 1 system (pressure 0.25 MPa)
Cooling water	Water temperature	16～18℃ (temp. fluctuation : ±0.1℃ or less)
Gas	SF₆	99.9% or higher、0～500 kPa
	N₂	99.99% or higher、0～500 kPa
	Air	600 k～800 kPa

Before placing an order, please check floor vibration, acoustic noise and magnetic flux in the installation room.
Concerning those allowable spec., please consult with our local representatives.

*1Option

*2Specifications and dimension depend on manufacturer, model and configuration.